Excimer laser gas

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Hydrogen Chloride Mixtures (HCL&Ne)


Hydrogen Chloride Mixtures are used in 308nm lithography applications.



MAJOR COMPONENTS

COMPONENTS CONCENTRATION RANGE
Hydrogen Chloride 5.0% 4.5% - 5.5%
Hydrogen 1.0% 0.9% - 1.1%
Neon Balance  



MAXIMUM IMPURITIES
COMPONENTS CONCENTRATION (ppmv)
Methane 1
Carbon Dioxide 3
Oxygen 3
Nitrogen 5
Carbon Monoxide 1
Moisture 5
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