Excimer laser gas

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Krypton Fluoride Mixtures (Kr&F2)


Krypton Fluoride Mixtures are used in 248nm lithography applications, usually in conjunction with an inert gas mixture.



MAJOR COMPONENTS
COMPONENTS CONCENTRATION RANGE
Fluorine 1.0% 0.9% - 1.0%
Krypton 1.25% 1.2 - 1.3%
Neon Balance  



MAXIMUM IMPURITIES
COMPONENTS CONCENTRATION (ppmv)
Carbon Dioxide <5.0
Carbon Monoxide <1.0
Carbon Tetrafluoride <2.0
Helium <8.0
Hydrogen Fluoride/Moisture <25.0
Nitrogen <25.0
Nitrogen Trifluoride <1.0
Oxygen <25.0
Sulphur Hexafluoride <1.0
Silicon Tetrafluoride <2.0
THC (as Moisture) <1.0
Xenon <1.0
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