Excimer laser gas

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Argon Fluoride Mixtures (Ar&F2)


 
Argon Fluoride Mixtures are used in 193nm lithography applications, usally in conjunction with and inert gas mixture.



MAJOR COMPONENTS

COMPONENTS CONCENTRATION RANGE
Fluorine 1.0% 0.9% - 1.0%
Argon 3.5% 3.4 - 3.6%
Neon Balance  



MAXIMUM IMPURITIES

COMPONENTS CONCENTRATION (ppmv)
Carbon Dioxide <5.0
Carbon Monoxide <1.0
Carbon Tetrafluoride <2.0
Helium <8.0
Hydrogen Fluoride/Moisture <25.0
Nitrogen <25.0
Nitrogen Trifluoride <1.0
Oxygen <25.0
Silicon Tetrafluoride <2.0
Sulphur Hexafluoride <1.0
THC (as Methane) <1.0
Xenon <10.0

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